CPM Seminar
Understanding the Tribological Chemistry
of Chlorine- and Sulfur- and Phosphorus-containing Additives
Wilfred Tysoe
Dept. of Chemistry and Laboratory for Surface Studies
University of Wisconsin-Milwaukee
Chlorine- and sulfur- and phosphorus-containing compounds are commonly added
to the base fluid to synthesize lubricants used under extreme-pressure (EP)
conditions. Analyzing the resulting tribological films on iron reveals
that chlorinated hydrocarbons thermally decompose forming a layer that
consists of iron chloride (FeCl2) or carbide (Fe3C),
and that dialkyldisulfides react to form FeS and Fe3C. Alkyl
phosphates thermally decompose on iron oxide to form alkyl and alkoxy,
as well as POx species, on the surface. The alkyl and alkoxy
species thermally decompose on heating to evolve gas-phase products
and deposit carbon onto the surface. The POx species rapidly
diffuse into the oxide forming a film that consists of a carbonaceous layer
covering a phosphate film. The tribological properties of evaporated and
reactively grown thin films have been investigated in ultrahigh vacuum. This
strategy eliminates contamination and allows films of known composition and
structure to be grown on well-characterized substrates. Three tribological
regimes are identified depending on film thickness. In the first regime,
an initial rapid decrease in friction is found when a film that is a few
nanometers thick (corresponding to a monolayer) covers the surface. The
friction coefficient increases once again in the second regime as the
film becomes thicker, due to the increased contact area between the film
and the rough tribotip, and the behavior is well described by a modified
Greenwood-Williamson model. A third regime is found when the film becomes
thicker than the interfacial roughness, where the surfaces are completely
separated by the film. Finally, measuring the friction coefficients of thin
halide films deposited onto various substrates, where the local pressure
at the asperity tips depends on the substrate hardness, shows that the
shear strength of the `monolayer' films depends on pressure.
Thursday, September 29th 2005, 15:30
Ernest Rutherford Physics Building, R.E. Bell Conference Room (room 103)
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