CPM Seminar

The IBM Nanostencil: instrument design and results

A novel tool for in-situ nanopatterning, structure analysis and electronic characterisation

Percy Zahl

IBM Zurich Research Laboratory

I'll talk about my work on and at the IBM Nanostencil. The Nanostencil is a tool for resistless lithography. It allows the direct patterning of complex nanometer-sized structures composed of a wide range of materials in an ultrahigh vacuum environment. This is combined with state-of-the-art scanning probe microscopy techniques (atomic force microscopy, scanning tunneling microscopy) and an electronic four-point probe. Moreover, all these capabilities are in situ and autoaligned in the field of view. The direct patterning is based on the shadow-mask technique and allows multimask processes in a static and dynamic manner. I will finish with an outlook about my plans for a second generation of the Nanostencil at BNL.